PVD Aluminum dual damascene interconnection: Yield comparison between counterbore and self aligned approaches

Proceedings of the IEEE 1999 International Interconnect Technology Conference, IITC 1999

Volumn , Issue , 1999, Pages 215-217

  Blosse, A ^a   Raghuram, U ^a   Thekdi, S ^a   Koutny, B ^a   Lau, G ^a   Koh, S L ^a   Goodenough, C ^a   Pouedras T ^a   Sethuraman, A ^a   Geha, S ^a   Chowdhury, T ^b   Guggilla, S ^b   Krishna, N ^b   Su, J ^b   Cha, C ^b   Yao, G ^b   Price, J B ^b  

^a CYPRESS SEMICONDUCTOR   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ASPECT RATIO; CHEMICAL MECHANICAL POLISHING; DEFECT DENSITY; PHOTORESISTS;

COMPARATIVE STUDIES; DUAL DAMASCENE; DUAL DAMASCENE INTERCONNECTION; DUMMY STRUCTURES; ETCH PROCESS; HIGH ASPECT RATIO; INTERCONNECT LINES; YIELD DEGRADATION;

INTEGRATED CIRCUIT INTERCONNECTS;

EID: 0037691138     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.1999.787126     Document Type: Conference Paper

References (8)

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3. J. Zang et al., "CVD Cu process integration for sub-0.25μm technologies. Proceeding of International Interconnect Technology Conference-IITC San Francisco, p. 163 (1998).
4. L.A. Clevenger et al., "A novel low temperature CVD/PVD Al filling process for producing highly reliable 0.175μm wiring/0.35μm pitch dual damascene interconnections in Gigabit scale DRAMS. Proceeding IITC San Francisco, p. 137 (1998).
5. J.G. Ryan et al., "Technology challenges for advanced interconnects" Proc. Advanced Metallization Conference (AMC) MRS p. 399 (1997).
6. G. Yao, D. Ding, H. Wang, C. Cha, S. Lai, M. Abburi and Z. Xu, "Advanced warm aluminum for 0.25μm plug filling" Proceeding of Advanced Metallization Conference AMC (1997), p 243.
7. B. Koutny et al., "PVD Aluminum Dual damascene Interconnect". unpublished
8. S.J. Weber et al., "Challen ges in designing an aluminum sub-0.20μm BEOL", Proceeding of Advanced Metallization Conference-AMC-(1998). MRS-in press