CNTs grown on the surface of various materials by large volume MP-CVD for VME applications

Applied Surface Science

Volumn 215, Issue 1-4 SPEC., 2003, Pages 209-213

  Liu, G Y ^a   Zhong, D Y ^a   Xia, S H ^a   Cheng, S F ^a   Ding, Y G ^a   Lu, Y J ^b   Shao, Y J ^b   Li, H Y ^c   Hangfu, L J ^c   Wang, E G ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b Acad of Enterprise Sci   (China)

^c BOE Institute of Optoelectronics Materials   (China)

Author keywords

Carbon nanotubes (CNT); Catalytic growth; Emitter; Field emission; Microwave plasma chemical vapor deposition (MP CVD)

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); STAINLESS STEEL; SUBSTRATES; SURFACE PHENOMENA; THIN FILMS;

SEMICONDUCTOR SUBSTRATES;

CARBON NANOTUBES;

EID: 0037672531     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00284-8     Document Type: Conference Paper

References (7)

1. Zhu W., Kochanski G.P., Jin S., Seibles L., Jacobson D., Mc Cormack M., White A. Appl. Phys. Lett. 67(8):1995;1157.
2. Zhu W., Kochanski G.P., Jin S. Science. 282:1998;1471.
3. J.S. Ke, H. Yu, R.L. Jin, J. Peng, G.Y. Liu, F.H. Wang, Y.N. Jiang, in: Proceedings of the Twelfth International Gas Discharge & Their Application Conference, vol. 2, Greifswald, Germany, September 1997, pp. 796-799.
4. Choi W.B.et al. Appl. Phys. Lett. 75(20):1999;3129.
5. Murakami H., Hirakawa M., Tanaka C., Yamakawa H. Appl. Phys. Lett. 76(13):2000;1776.
6. Yu J., Wang E.G., Bai X.D. Appl. Phys. Lett. 78(15):2001;2226.
7. Zhong D.Y., Liu S., Zhang G.Y., Wang E.G. J. Appl. Phys. 89(11):2001;5939.