Formation of TiO2-xFx compounds in fluorine-implanted TiO2

Journal of Materials Science Letters

Volumn 21, Issue 1, 2002, Pages 33-35

  Yamaki, Tetsuya ^a   Sumita, T ^a   Yamamoto, S ^a  

^a TAKASAKI ADVANCED RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; FLUORINE; IMPURITIES; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS; X RAY PHOTOELECTRON SPECTROSCOPY;

RUTILE SINGLE CRYSTALS;

TITANIUM DIOXIDE;

EID: 0036206174     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1014282225859     Document Type: Article

References (13)