Femtosecond laser ablation of Cr-SiO2 binary mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4830, Issue , 2002, Pages 510-514

  Okamoto, Tomohiro ^a   Morishige, Yukio ^b   Ohmura, Etsuji ^a   Sano, Tomokazu ^a   Miyamoto, Isamu ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

Ablation; Cr photomask; Diffraction; Femtosecond laser; Microfabrication

Indexed keywords

CHROMIUM COMPOUNDS; ELECTROMAGNETIC WAVE DIFFRACTION; FABRICATION; LASER PULSES; MASKS;

FEMTOSECOND LASER ABLATION;

LASER ABLATION;

EID: 0037621785     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.486596     Document Type: Conference Paper

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