New projection exposure using a double-line matrix of optical fibers in place of a reticle

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 A, 2003, Pages 1820-1827

  Horiuchi, Toshiyuki ^a   Aichi, Shintaro ^a   Kawamura, Yasuhisa ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Double line matrix; Micromachine; Optical fiber; Projection exposure; Reticleless exposure; Scan exposure

Indexed keywords

HIGH INTENSITY LIGHT; LIQUID CRYSTAL DISPLAYS; LITHOGRAPHY; MIRRORS; PRINTING; SCANNING;

DOUBLE LINE MATRIX; PROJECTION EXPOSURE METHOD; RETICLE;

OPTICAL FIBERS;

EID: 0037594071     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.1820     Document Type: Article

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