Mathematical model of galvanostatic pulse with reverse plating in the presence of a surface blocking agent

Journal of the Electrochemical Society

Volumn 150, Issue 6, 2003, Pages

  Yin, K M ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ADDITIVES; ADSORPTION; ELECTROCHEMICAL ELECTRODES; GALVANOMAGNETIC EFFECTS; KINETIC THEORY; MATHEMATICAL MODELS; SURFACE ACTIVE AGENTS;

ADDITIVE ADSORPTION CHARACTERISTICS; ADDITIVE INCLUSION CHARACTERISTICS; DEPOSITED METAL MATRIX; GALVANOSTATIC PULSE; INERT BLOCKING INHIBITORS; REVERSE PLATING; SURFACE BLOCKING AGENT;

ELECTROPLATING;

EID: 0037594064     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1573198     Document Type: Article

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