Characteristics of shunting arc discharge for carbon ion source

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 794-797

  Takaki, K ^a   Mukaigawa, S ^a   Fujiwara, T ^a   Kumagai, M ^b   Yukimura, K ^b  

^a IWATE UNIVERSITY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

Carbon; Ion current; Ion extraction; Plasma based ion implantation (PBII); Shunting arc

Indexed keywords

CAPACITORS; CARBON; ELECTRIC ARCS; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ION IMPLANTATION; PLASMA APPLICATIONS; VACUUM;

SHUNTING ARC DISCHARGE;

ION SOURCES;

EID: 0037566947     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00851-6     Document Type: Conference Paper

References (4)

1. Yukimura K., Isano R., Monguchi T., Yoshioka K. J. Vac. Sci. Technol. B. 17:1999;871.
2. Yukimura K., Masamune S. Rev. Sci. Instr. 73:2002;860.
3. Yukimura K., Tani Y. Surf. Coat. Technol. 142-144:2001;388.
4. K. Yukimura, X.X. Ma, T. Maruyama, M. Kumagai, M. Kohata, H. Saito, Abstracts of Eighth International Conference on Plasma Surface Engineering, FrOA7, 2002, p. 184. [blank_line]