The benefits of dynamic reaction cell ICP-MS technology to determine ultra trace metal contamination levels in high purity phosphoric and sulfuric acid

Atomic Spectroscopy

Volumn 24, Issue 2, 2003, Pages 57-65

  Kawabata, Katsu ^a   Kishi, Yoko ^a   Thomas, Robert ^b  

^a PerkinElmer Life/Analytical Sciences   (Canada)

^b Scientific Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOSPHORIC ACID; SULFURIC ACID; TRACE METAL;

ARTICLE; CHEMICAL ANALYSIS; DYNAMICS; MASS SPECTROMETER; MASS SPECTROMETRY; PLASMA; SEMICONDUCTOR; SPECTROSCOPY; TECHNOLOGY;

EID: 0037566445     PISSN: 01955373     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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