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Volumn 71, Issue 9, 2000, Pages 3444-3450

Triode electron bombardment evaporation source for ultrahigh vacuum thin film deposition

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0037533297     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1287624     Document Type: Article
Times cited : (24)

References (13)
  • 2
    • 0003680984 scopus 로고
    • edited by L. Maissel and R. Glang McGraw-Hill, New York
    • R. Glang, in Handbook of Thin Film Technology, edited by L. Maissel and R. Glang (McGraw-Hill, New York, 1970).
    • (1970) Handbook of Thin Film Technology
    • Glang, R.1
  • 9
    • 85037459236 scopus 로고
    • Internal Rep. CNR-IMAI, RT2/91
    • S. Iacobucci and M. Montagnoli, Internal Rep. CNR-IMAI, RT2/91, 1991.
    • (1991)
    • Iacobucci, S.1    Montagnoli, M.2
  • 11
    • 0003587776 scopus 로고
    • Idaho National Engineering Laboratory
    • D. A. Dahl, SIMION 3D version 6.0, Idaho National Engineering Laboratory, 1995.
    • (1995) SIMION 3D Version 6.0
    • Dahl, D.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.