Mechanism of flat band voltage shift of organic material with low dielectric constant for ULSI interconnection

Materials Science and Engineering: B

Volumn 98, Issue 1, 2003, Pages 45-53

  Chang, C L ^a   Huang, T J ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Dielectric constant; Flat band voltage shift; Ion migration; Polarization

Indexed keywords

DESORPTION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONS; LEAKAGE CURRENTS; MOISTURE; PERMITTIVITY; POLARIZATION; ULSI CIRCUITS;

THERMAL DESORPTION MASS SPECTRUM (TDMS);

MATERIALS SCIENCE;

EID: 0037465564     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00678-5     Document Type: Article

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