Growth of highly (001)-textured strontium barium niobate thin films on epitaxial LaNiO3/CeO2/YSZ/Si(100)

Thin Solid Films

Volumn 426, Issue 1-2, 2003, Pages 62-67

  Chiu, Te Wei ^a   Wakiya, Naoki ^a   Shinozaki, Kazuo ^a   Mizutani, Nobuyasu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Strontium barium niobate; Thin film; Tungsten bronze

Indexed keywords

CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; MORPHOLOGY; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; TEXTURES;

UNIT CELLS;

THIN FILMS;

EID: 0037463316     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01304-4     Document Type: Article

References (29)

1. Vasquez R.A., Ewbank M.D., Neugaonkar R.R. Opt. Commun. 80:1991;235.
2. Zhang Y.L., Xie X.S., Mo D., Pun E.Y.B., Shi L.P. J. Appl. Phys. 79:1996;8835.
3. Vré R.D., Hesselink L. J. Opt. Soc. Am. B. 11:1994;1800.
4. Aronson L.B., Hesselink L. Opt. Lett. 15:1990;30.
5. Hesselink L., Bashaw M.C. Opt. Quantum Electron. 25:1993;S611.
6. Sakamoto S., Yazaki T. Appl. Phys. Lett. 22:1973;429.
7. Webster J.C., Zernike F. Ferroelectrics. 10:1976;249.
8. Castellans R.N., Feinstein L.G. J. Appl. Phys. 50:1979;4406.
9. Maciolek R.B., Liu S.T. J. Electron. Mater. 2:1973;191.
10. Chen C.J., Xu Y., Xu R., Mackenzie J.D. J. Appl. Phys. 69:1991;1763.
11. Hirano S., Yogo T., Kikuta K., Ogiso K. J. Am. Ceram. Soc. 75:1992;1697.
12. Nystrom M.J., Wessels B.W., Lin W.P., Wong G.K., Neumayer D.A., Marks T.J. Appl. Phys. Lett. 66:1995;1726.
13. Neurgaonkar R.R., Santha I.S., Oliver J.R. Mater. Res. Bull. 26:1991;983.
14. Thöny S.S., Youden K.E. Jr, Harris J.S., Hesselink L. Appl. Phys. Lett. 65:1994;2018.
15. Liu Y., Ong C.W., Choy C.L., Chan P.W. Mater. Res. Soc. Symp. Proc. 433:1996;131.
16. Song Z., Lin C., Wang L., Huang J., Hesse D., Zakharov N.D., Xu H., Okuyam M. Appl. Phys. A. 70:2000;355-358.
17. Chiu T.W., Wakiya N., Shinozaki K., Mizutani N. J. Ceram. Soc. Jpn. 110:2002;368.
18. Copetti C.A., Soltner H., Schubert J., Zander W., Hollricher O., Buchal C., Schulz H., Tellmann N., Klein N. Appl. Phys. Lett. 63:1993;1429.
19. Haakenaasen R., Fork D.K., Colovchenko J.A. Appl. Phys. Lett. 64:1994;1573.
20. Li Y., Linzen S., Seidel P., Machalett F., Schmidl F., Schneidewind H., Schmauder T., Cihar R., Schaller S. Inst. Phys. Conf. Ser. 148:1995;911.
21. Méchin L., Villégier J.C., Rolland G., Laugier F. Physica C. 269:1996;124.
22. Yamada T., Wakiya N., Shinozaki K., Mizutani N. Jpn. J. Appl. Phys. 40:2001;281-284.
23. Sánchez F., Ferrater C., Alcobé X., Bassas J., García-Cuenca M.V. Thin Solid Films. 384:2001;200.
24. James A.R., Pignolet A., Senz S., Zakharov N.D., Hess D. Solid-State Commun. 114:2000;249.
25. Satyalakshmi K.M., Mallya R.M., Ramanathan K.V., Wu X.D., Brainard B., Gautier D.C., Vasanthacharya N.Y., Hegde M.S. Appl. Phys. Lett. 62:1993;1233.
26. Bao D., Wakiya N., Shinozaki K., Mizutani N., Yao X. Appl. Phys. Lett. 78:2001;3286.
27. Wakiya N., Yamada T., Shinozaki K., Mizutani N. Thin Solid Films. 371:2000;211.
28. Sakamoto W., Yogo T., Kikuta K., Ogiso K., Kawase A., Hirano S. J. Am. Ceram. Soc. 79:1996;2283.
29. Nakano M., Tabata H., Tanaka K., Katayama Y., Kawai T. Jpn. J. Appl. Phys. 36:1997;L1331.