Formation process and microstructural evolution of Ni-silicide layers grown by chemical vapor deposition of Si on Ni substrates

Surface and Coatings Technology

Volumn 168, Issue 2-3, 2003, Pages 241-248

  Yoon, Jin Kook ^a   Byun, Ji Young ^a   Kim, Gyeung Ho ^a   Lee, Jong Kwon ^a   Yoon, Ho Sang ^b   Hong, Kyung Tae ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b NOVATEMS Inc   (South Korea)

Author keywords

CVD of Si; Formation process; Microstructure evolution; Ni silicides; Nickel

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MICROSTRUCTURE; MIXTURES; SILICON;

HOT WALL REACTORS;

NICKEL COMPOUNDS;

FILM;

EID: 0037461468     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00269-X     Document Type: Article

References (25)

1. S. Motojima, M. Kohno, T. Kattori, J. Mater. Sci. 22 (1987) 547.
2. J. Daimer, E. Fitzer, J. Schlichting, Thin Solid Films 84 (1981) 119.
3. P. Felix, E. Erdös Werkst. Korros. 23 (1972) 627.
4. A.L. Cabera, J.F. Kirner, J.N. Armor, J. Mater. Res. 6 (1996) 71.
5. F. Roccaforte, F. La Via, V. Rauberum, L. Calcagno, P. Musumeci, Appl. Surf. Sci. 184 (2001) 295.
6. J. Crofton, P.G. McMullin, J.R. Williams, M.J. Bozack, J. Appl. Phys. 77 (1995) 1317.
7. M.I. Osendi, A. De Palbos P. Miranzo, Mater. Sci. Eng. Part A 308 (2001) 53.
8. E. Heikinheimo, A. Kodenstov, J.A. van Beek, J.A. Klomp, F.J.J. van Loo, Acta. Metall. Mater. 40 (1992) 111.
9. P. Nash, A. Nash, Bull. Binary Phase Diagrams 8 (1987) 6.
10. K.N. Tu, G. Ottoviani, U. Gösele, H. Föll, J. Appl. Phys. 54 (1983) 758.
11. G. Ottoviani, J. Vac. Sci. Technol. 16 (1979) 1122.
12. J.C. Ciccarello, S. Poize, P. Gas, J. Appl. Phys. 67 (1990) 3315.
13. T. Shimozaki, T. Narishuage, Y. Wakamatsu, M. Onishi, Mater. Trans. JIM 35 (1994) 868.
14. J.H. Gülpen, A.A. Kodentsov, F.J. van Loo, Z. Metallkd. 86 (1995) 530.
15. R.C.J. Schiepers, Ph.D. Thesis, Eindhoven University of Technology, 1991.
16. A. Olsen, F.R. Sale, Met. Technol. 7 (1980) 494.
17. S. Motojima, M. Kohno, T. Hattori, J. Mater. Sci. 22 (1987) 770.
18. G. Wahl, B. Furst, in: D.R. Holmes, A. Rahmel (Eds.), Materials and Coatings to Resist High Temperature Corrosion, Applied Science Publishers Ltd, London, 1978, p. 529.
19. J.K. Yoon, J.Y. Byun, G.H. Kim, J.K. Lee, H.S. Yoon, J.S. Kim, Surf. Coat. Technol., submitted for publication.
20. R. Pretorius, C.L. Ramiller, S.S. Lau, M.A. Nicolet, Appl. Phys. Lett. 30 (1977) 501.
21. K.N. Tu, W.K. Chu, J.W. Mayer, Thin Solid Films 25 (1975) 403.
22. G.W. Wang, B. Gleeson, D.L. Douglass, Oxid. Met. 31 (1989) 415.
23. S.R. Shatynski, I.P. Hirth, R.A. Rapp, Acta Metall. 24 (1975) 1071.
24. D.S. Williams, R.A. Rapp, J.P. Hirth, Metall. Trans. A 12 (1981) 639.
25. C.E. Morosanu (Ed.), Thin Films by Chemical Vapour Deposition, Elsevier, Amsterdam, 1990, p. 104.