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Volumn 167, Issue 2-3, 2003, Pages 165-169

Effect of nitrogen partial pressure and temperature on RF sputtered Fe-N films

Author keywords

Fe N film; Nitrides; Phase composition; RF magnetron sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; MAGNETIC RECORDING; MAGNETIZATION; MICROSTRUCTURE; PARTIAL PRESSURE; PHASE COMPOSITION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 0037461177     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00910-6     Document Type: Article
Times cited : (16)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.