Effects of film thickness on formation processes of Fe16N2 in nitrogen ion-implanted Fe films

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 129-134

  Shinno, H ^a   Saito, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Fe16N2; Film thickness; Ion implantation; Thin film

Indexed keywords

ANNEALING; ION IMPLANTATION; IRON COMPOUNDS; MAGNETIZATION; NITROGEN; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); TEMPERATURE; THICKNESS MEASUREMENT; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

DEFECT FORMATION; IRON NITRIDE; SATURATION MAGNETIZATION;

THICK FILMS;

EID: 0032067884     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00388-0     Document Type: Article

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