Dissociation of multiply ionized carbonyl sulfide due to electron impact

Journal of Chemical Physics

Volumn 118, Issue 12, 2003, Pages 5383-5389

  Wang, Pengqian ^a   Vidal, C R ^a  

^a MAX PLANCK INSTITUT FÜR EXTRATERRESTRISCHE PHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL MAPPING; DISSOCIATION; ELECTRON ENERGY LEVELS; IMPACT IONIZATION; MASS SPECTROMETRY; MOLECULAR DYNAMICS; POSITIVE IONS; STATISTICAL METHODS;

BETHE METHOD; CARBONYL SULFIDE; ELECTRON IMPACT IONIZATION; THREE-DIMENSIONAL COVARIANCE MAPPING; TIME-OF-FLIGHT MASS SPECTROMETER;

SULFUR COMPOUNDS;

EID: 0037461040     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1554738     Document Type: Article

References (42)

1. H. O. Folkerts, F. W. Bliek, M. C. de Jong, R. Hoekstra, and R. Morgenstern, J. Phys. B 30, 5833 (1997).
2. T. Masuoka and H. Doi, Phys. Rev. A 47, 278 (1993).
3. D. A. Hagan and J. H. D. Eland, Rapid Commun. Mass Spectrom. 3, 186 (1989).
4. U. Ankerhold, B. Esser, and F. von Busch, Chem. Phys. 220, 393 (1997).
5. D. Mathur, Phys. Rep. 225, 193 (1993).
6. D. Schröder and H. Schwarz, J. Phys. Chem. A 103, 7385 (1999).
7. M. Larsson, Comments At. Mol. Phys. 29, 39 (1993).
8. P. G. Fournier, J. Fournier, F. Salama, P. J. Richardson, and J. H. D. Eland, J. Chem. Phys. 83, 241 (1985).
9. J. H. D. Eland, F. S. Wort, and R. N. Royds, J. Electron Spectrosc. Relat. Phenom. 41, 297 (1986).
10. S. Hsieh and J. H. D. Eland, J. Phys. B 30, 4515 (1997).
11. L. J. Frasinski, K. Codling, and P. A. Hatherly, Science 246, 1029 (1989).
12. R. Feng, G. Cooper, and C. E. Brion, Chem. Phys. 252, 359 (2000).
13. T. Masuoka and I. Koyano, J. Chem. Phys. 95, 909 (1991).
14. T. Masuoka, J. Chem. Phys. 98, 6989 (1993).
15. T. Masuoka, Can. J. Phys. 74, 850 (1996).
16. D. M. Curtis and J. H. D. Eland, Int. J. Mass Spectrom. Ion Processes 63, 241 (1985).
17. J. H. D. Eland, Mol. Phys. 61, 725 (1987).
18. B. Esser, U. Ankerhold, N. Anders, and F. von Busch, J. Phys. B 30, 1191 (1997).
19. U. Ankerhold, B. Esser, and F. von Busch, J. Phys. B 30, 1207 (1997).
20. R. G. Cooks, D. T. Terwilliger, and J. H. Beynon, J. Chem. Phys. 61, 1208 (1974).
21. M. J. Hubin-Franskin, D. Huard, and P. Marmet, Int. J. Mass Spectrom. Ion Phys. 27, 263 (1978).
22. W. M. Huo and Y.-K. Kim, IEEE Trans. Plasma Sci. 27, 1225 (1999).
23. E. Meeks and P. Ho, Thin Solid Films 365, 334 (2000).
24. C. Tian and C. R. Vidal, Phys. Rev. A 59, 1955 (1999).
25. C. Tian and C. R. Vidal, Phys. Rev. A 58, 3783 (1998).
26. P. Wang and C. R. Vidal, J. Chem. Phys. 116, 4023 (2002).
27. P. Wang and C. R. Vidal, Chem. Phys. 280, 309 (2002).
28. C. Tian and C. R. Vidal, J. Phys. B 31, 5369 (1998).
29. C. Tian and C. R. Vidal, J. Chem. Phys. 108, 927 (1998).
30. M. R. Bruce, L. Li, C. R. Sporleder, and R. A. Bonham, J. Phys. B 27, 5773 (1994).
31. I. Ben-Itzhak, S. G. Ginther, and K. D. Carnes, Phys. Rev. A 47, 2827 (1993).
32. I. Ben-Itzhak, K. D. Carnes, S. G. Ginther, D. T. Johnson, P. J. Norris, and O. L. Weaver, Phys. Rev. A 47, 3748 (1993).
33. H. C. Straub, P. Renault, B. G. Lindsay, K. A. Smith, and R. F. Stebbings, Phys. Rev. A 52, 1115 (1995).
34. C. Ma, M. R. Bruce, and R. A. Bonham, Phys. Rev. A 44, 2921 (1991).
35. B. Brehm, J. Grosser, T. Ruscheinski, and M. Zimmer, Meas. Sci. Technol. 6, 953 (1995).
36. L. J. Frasinski, M. Stankiewicz, K. J. Randall, P. A. Hartherly, and K. Codling, J. Phys. B 19, L819 (1986).
37. R. Thissen, J. Delwiche, J. M. Robbe, D. Duflot, J. P. Flament, and J. H. D. Eland, J. Chem. Phys. 99, 6590 (1993).
38. Y.-K. Kim, W. Hwang, N. M. Weinberger, M. A. Ali, and M. E. Rudd, J. Chem. Phys. 106, 1026 (1997).
39. H. Deutsch, K. Becker, S. Matt, and T. D. Märk, Int. J. Mass. Spectrom. 197, 37 (2000).
40. D. Margreiter, H. Deutsch, M. Schmidt, and T. D. Märk, Int. J. Mass Spectrom. Ion Processes 100, 157 (1990).
41. W. Hwang, Y.-K. Kim, and M. E. Rudd, J. Chem. Phys. 104, 2956 (1996).
42. M. Hamdan, D. P. Almeida, and A. G. Brenton, J. Phys. B 22, 1817 (1989).