Excitation site-specific ion desorption study of Si(1 1 1) surfaces fluorinated by XeF2 using photoelectron photoion coincidence spectroscopy

Surface Science

Volumn 528, Issue 1-3, 2003, Pages 255-260

  Kobayashi, Eiichi ^a   Isari, Kouji ^a,b   Mase, Kazuhiko ^a  

^a INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Halides; Photoelectron spectroscopy; Photon stimulated desorption (PSD); Silicon; Synchrotron radiation photoelectron spectroscopy

Indexed keywords

ESTIMATION; FLUORINE COMPOUNDS; IONS; PHOTOELECTRON SPECTROSCOPY; PROBABILITY; SURFACE PHENOMENA; SYNCHROTRON RADIATION;

FLUORINATION;

DESORPTION;

EID: 0037457325     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)02641-9     Document Type: Conference Paper

References (13)

1. Nagaoka S., Mase K., Koyano I. Trends Chem. Phys. 6:1997;1.
2. Yarmoff J.A., McFeely F.R. Phys. Rev. B. 38:1988;2057.
3. Yarmoff J.A., Taleb-Ibrahimi A., McFeely F.R., Avouris Ph. Phys. Rev. Lett. 60:1988;960.
4. Yarmoff J.A., Joyce S.A. J. Vac. Sci. Technol. A. 7:1989;2445.
5. Yarmoff J.A., Joyce S.A. Phys. Rev. B. 40:1989;3143.
6. Lo C.W., Shuh D.K., Yarmoff J.A. J. Vac. Sci. Technol. A. 11:1993;2054.
7. Lo C.W., Shuh D.K., Chakarian V., Durbin T.D., Varekamp P.R., Yarmoff J.A. Phys. Rev. B. 47:1993;15648.
8. Mase K., Tanaka S. Jpn. J. Appl. Phys. Suppl. 38(1):1999;233.
9. K. Isari, E. Kobayashi, K. Mase, K. Tanaka, Surf. Sci. 528 (2003) 261.
10. Egelhoff W.F. Jr. Surf. Sci. Rep. 6:1987;253.
11. Moulder J.F., Stickle W.F., Sobol P.E., Bomben K.D. Chastain J., King R.C. Jr. Handbook of X-ray Photoelectron Spectroscopy. 1995;Physical Electronics, Inc.
12. Akbulut M., Sack N.J., Madey T.E. Surf. Sci. Rep. 28:1997;177.
13. Nagaoka S., Mase K., Nakamura A., Nagao M., Yoshinobu J., Tanaka S. J. Chem. Phys. 117:2002;3961.