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Acta Materialia

Volumn 51, Issue 7, 2003, Pages 1937-1943

In-situ TEM tensile testing of DC magnetron sputtered and pulsed laser deposited Ni thin films

(6) Hugo, R C a,e Kung, H a Weertman, J R b Mitra, R c Knapp, J A d Follstaedt, D M d

a LOS ALAMOS NATIONAL LABORATORY (United States)

b Northwestern University (United States)

c DEFENCE METALLURGICAL RESEARCH LABORATORY (India)

d SANDIA NATIONAL LABORATORIES (United States)

e PORTLAND STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; CRACKS; DISLOCATIONS (CRYSTALS); GRAIN BOUNDARIES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NICKEL; POROSITY; PULSED LASER DEPOSITION; TENSILE TESTING; TRANSMISSION ELECTRON MICROSCOPY;

INTERGRANULAR CRACKS;

THIN FILMS;

EID: 0037453245 PISSN: 13596454 EISSN: None Source Type: Journal
DOI: 10.1016/S1359-6454(02)00599-2 Document Type: Article

Times cited : (221)

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