Dissociation of water on a flat, ordered silica surface

Langmuir

Volumn 19, Issue 4, 2003, Pages 1140-1142

  Kim, Y D ^a   Wei, T ^a   Stultz, J ^a   Goodman, D W ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROXYL GROUP; METASTABLE IMPACT ELECTRON SPECTROSCOPY; MULTILAYER-INDUCED DISSOCIATION; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; DISSOCIATION; HYDROGEN BONDS; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR DYNAMICS; PHOTOELECTRON SPECTROSCOPY; SURFACE CHEMISTRY; TEMPERATURE PROGRAMMED DESORPTION; ULTRAVIOLET SPECTROSCOPY; WATER;

SILICA;

EID: 0037452784     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la020734k     Document Type: Article

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