AlSi(Cu) anodic oxide layers formed in H2SO4 at low temperature using different current waveforms

Surface and Coatings Technology

Volumn 165, Issue 3, 2003, Pages 232-240

  Fratila Apachitei, L E ^a   Duszczyk, J ^a   Katgerman, L ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aluminum; Anodic oxide layers; Current waveforms; Microhardness; Surface roughness

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; LOW TEMPERATURE OPERATIONS; MICROHARDNESS; MORPHOLOGY; SUBSTRATES; SULFURIC ACID; SURFACE ROUGHNESS; TRANSIENTS;

CURRENT WAVEFORMS; LAYER GROWTH;

ANODIC OXIDATION;

COATING;

EID: 0037450434     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00733-8     Document Type: Article

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