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Volumn 649, Issue 1-2, 2003, Pages 95-103

Matrix isolation and theoretical study of the reaction of HSiCl3 and CH3OH: Infrared spectroscopic characterization of Cl2HSiOCH3

Author keywords

Chemical vapor deposition; Isotopomers; Matrix isolation

Indexed keywords

SILICON DERIVATIVE;

EID: 0037445895     PISSN: 00222860     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-2860(03)00046-2     Document Type: Article
Times cited : (6)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.