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Volumn 649, Issue 1-2, 2003, Pages 95-103
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Matrix isolation and theoretical study of the reaction of HSiCl3 and CH3OH: Infrared spectroscopic characterization of Cl2HSiOCH3
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Author keywords
Chemical vapor deposition; Isotopomers; Matrix isolation
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Indexed keywords
SILICON DERIVATIVE;
ARTICLE;
CALCULATION;
CHEMICAL REACTION;
FILM;
INFRARED SPECTROSCOPY;
REACTION ANALYSIS;
SEMICONDUCTOR;
SPECTROSCOPY;
VAPOR;
VIBRATION;
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EID: 0037445895
PISSN: 00222860
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-2860(03)00046-2 Document Type: Article |
Times cited : (6)
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References (20)
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