Plume dynamics of iron disilicide studied by time-of-flight mass spectroscopy

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 52-56

  Narazaki, A ^a   Sato, T ^a   Kawaguchi, Y ^a   Niino, H ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Iron disilicide; Laser ablation; Photoionization; Time of flight mass spectroscopy

Indexed keywords

CRYSTALLIZATION; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; MASS SPECTROMETRY; PHOTOIONIZATION; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SILICON; SYNTHESIS (CHEMICAL); EXCIMER LASERS; KINETIC ENERGY; LASER ABLATION;

THERMAL EMISSIONS; PLUME DYNAMICS;

IRON COMPOUNDS;

EID: 0037443166     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01335-1     Document Type: Conference Paper

References (14)

1. Leon D., Harry M., Reeson K.J., Homewood K.P. Nature. 387:1997;686.
2. Birdwell A.G., Glosser R., Leong D.N., Homewood K.P. J. Appl. Phys. 89:2001;965.
3. Maeda Y., Umezawa K., Hayashi Y., Miyake K. Thin Solid Films. 381:2001;219.
4. Suemasu T., Fujii T., Iikura Y., Takakura K., Hasegawa F. Jpn. J. Appl. Phys. 37:1998;L1513.
5. Chu S., Hirohada T., Kan H. Jpn. J. Appl. Phys. 41:2002;L299.
6. Yoshitake T., Nagamoto T., Nagayama K. Thin Solids Films. 381:2001;236.
7. Komuro S., Katsumata T., Morikawa T., Kokai H., Zhao X., Aoyagi Y. J. Cryst. Growth. 237-239:2002;1961.
8. Liu Z., Okoshi M., Hanabusa M. J. Vac. Sci. Technol. A. 17:1999;619.
9. Hansen S.G. J. Appl. Phys. 66:1989;3329.
10. Grivas C., Niino H., Yabe A. Appl. Phys. A. 69:1999;S159.
11. R. Kelly, A. Miotello, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, pp. 55-87.
12. D.B. Geohegan, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, pp. 55-87.
13. Ermer D.R., Langford S.C., Dickinson J.T. J. Appl. Phys. 81:1997;1495.
14. Bulgakova N.M., Bulgakov A.V., Bobrenok O.F. Phys. Rev. E62:2000;5624.