Continuous wave ultraviolet radiation induced frustration of etching in lithium niobate single crystals

Applied Surface Science

Volumn 206, Issue 1-4, 2003, Pages 46-52

  Mailis, S ^a   Riziotis, C ^a   Smith, P G R ^a   Scott, J G ^a   Eason, R W ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Chemical etching; Lithium niobate; Surface patterning; Ultraviolet radiation

Indexed keywords

CONTINUOUS WAVE LASERS; ETCHING; IRRADIATION; LIGHTING; LITHIUM NIOBATE; PHOTOLITHOGRAPHY; RAMAN SPECTROSCOPY; ULTRAVIOLET RADIATION;

SURFACE PATTERNING;

SINGLE CRYSTALS;

EID: 0037441123     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01117-0     Document Type: Article

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