Fabrication of spin-frustrated Sm2Mo2O7 epitaxial films: High throughput optimization using a temperature gradient method

Applied Physics Letters

Volumn 82, Issue 10, 2003, Pages 1571-1573

  Nishimura, J ^a,d   Fukumura, T ^a   Ohtani, M ^a,d   Taguchi, Y ^a   Kawasaki, M ^a   Ohkubo, I ^b   Koinuma, H ^b   Ohguchi, H ^c   Ono, K ^c   Oshima, ^c   Tokura, Y ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; HALL EFFECT; MAGNETIZATION; PULSED LASER DEPOSITION; SEMICONDUCTING SAMARIUM COMPOUNDS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY;

THIN FILMS;

EID: 0037429994     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1559440     Document Type: Article

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