Combining HW-CVD and PECVD techniques to produce a-Si:H films

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 231-235

  Ferreira, I ^a   Fortunato, E ^a   Martins, R ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

Energy delivered to gas dissociation; HW CVD process; HWPA CVD process; Mass spectrometry

Indexed keywords

DISSOCIATION; FILM GROWTH; MASS SPECTROMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

INTRINSIC FILMS;

AMORPHOUS FILMS;

EID: 0037416653     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01187-2     Document Type: Conference Paper

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