Alternative phosphorus-doped amorphous silicon using trimethylphosphine diluted in hydrogen

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 270-273

  Terasa, R ^a   Albert, M ^a   Bartha, J W ^a   Roessler, T ^a   Abramov, A S ^b   Kosarev, A I ^b   Kuduyarova, V K ^b   Vinogradov, A ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IOFFE INSTITUTE   (Russian Federation)

Author keywords

Amorphous silicon films; Trimethylphosphine; VHF resonance plasma source

Indexed keywords

AMORPHOUS FILMS; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON CARBIDE; SOLAR CELLS; ULTRAVIOLET SPECTROSCOPY;

GAS MIXTURES;

AMORPHOUS SILICON;

EID: 0037416548     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01207-5     Document Type: Conference Paper

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