Kinetic study of antibody adhesion on a silicon wafer by laser reflectometry

Optics and Lasers in Engineering

Volumn 39, Issue 5-6, 2003, Pages 589-598

  Riquelme, Bibiana D ^a,b   Valverde, Juana R ^a,b   Rasia, Rodolfo J ^a,b  

^a UNIVERSIDAD NACIONAL DE ROSARIO   (Argentina)

^b INSTITUTO DE FÍSICA ROSARIO   (Argentina)

Author keywords

Antibody adhesion; Immunosensor; Laser reflectometry; Null ellipsometry; Optical biosensor; Silicon wafer

Indexed keywords

ADHESION; ANTIBODIES; ANTIGENS; IMMUNOSENSORS; KINETIC ENERGY; QUALITY CONTROL; REFLECTOMETERS;

LASER REFLECTOMETRY;

SILICON WAFERS;

EID: 0037402010     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0143-8166(02)00048-9     Document Type: Conference Paper

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