Holographic voltage profiling on 75 nm gate architecture CMOS devices

Ultramicroscopy

Volumn 94, Issue 3-4, 2003, Pages 277-281

  Thesen, Alexander E ^a   Frost, Bernhard G ^a   Joy, David C ^a  

^a UNIVERSITY OF TENNESSEE   (United States)

Author keywords

CMOS devices; Dopant profiling; Electron holography

Indexed keywords

ELECTRON MICROSCOPY; ELECTRON OPTICS; HOLOGRAMS; HOLOGRAPHIC OPTICAL ELEMENTS; PROGRAM PROCESSORS; VOLTAGE MEASUREMENT;

DUAL BEAM SYSTEMS;

CMOS INTEGRATED CIRCUITS;

ARCHITECTURE; ARTICLE; DEVICE; ELECTRIC POTENTIAL; ELECTRON; HOLOGRAPHY; MICROSCOPE; SAMPLE; SEMICONDUCTOR; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRICITY; HOLOGRAPHY; MICROSCOPY, ELECTRON, SCANNING; TRANSISTORS;

EID: 0037375371     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00337-6     Document Type: Article

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