Miniaturized electrostatic analyzer manufactured using photolithographic etching

Review of Scientific Instruments

Volumn 74, Issue 3, 2003, Pages 1192-1195

  Enloe, C L ^a   Krause, L Habash ^a   Haaland, R K ^a   Patterson, T T ^a   Richardson, C E ^a   Lazidis, C C ^a   Whiting, R G ^a  

^a UNITED STATES AIR FORCE ACADEMY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; CONDUCTIVE FILMS; ELECTRON BEAMS; FABRICATION; INSULATING MATERIALS; LAMINATING; MINIATURE INSTRUMENTS; PHOTOLITHOGRAPHY; PLASMA ETCHING; POLYTETRAFLUOROETHYLENES; STAINLESS STEEL;

ELECTROSTATIC ANALYZERS;

ELECTROSTATIC DEVICES;

EID: 0037352397     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1540715     Document Type: Article

References (9)

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5. Sandia National Laboratory maintains an extensive set of still and video images of complex MEMS devices, as well as technical information on the fabrication processes used to create them, on their Web site at http:// mems.sandia.gov/scripts/index.asp
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