A viable solution: In situ processing for etch

Solid State Technology

Volumn 46, Issue 3, 2003, Pages 44-48

  Gottscho, Richard A ^a   LaCara, Judy K ^a   Tietz, James V ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; IN SITU PROCESSING; PLASMAS; PRESSURE EFFECTS; SEMICONDUCTING SILICON; SPUTTERING; THIN FILMS;

IN SITU ETCH PROCESSING; PLASMA CLEANING;

ETCHING;

EID: 0037348018     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

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