Formation of tungsten oxide defects during tungsten CMP

Electrochemical and Solid-State Letters

Volumn 6, Issue 3, 2003, Pages

  Jeong, Jong Yeol ^a   Lee, Won Gyu ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b Kangwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; CONTAMINATION; CRYSTAL DEFECTS; IMPURITIES; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

PLANARIZATION;

CHEMICAL MECHANICAL POLISHING;

EID: 0037339035     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1545195     Document Type: Article

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