Design of deeply etched antireflective waveguide terminators

IEEE Journal of Quantum Electronics

Volumn 39, Issue 2, 2003, Pages 384-391

  Zhou, Gui Rong ^a   Li, Xun ^a   Feng, Ning Ning ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

Antireflection (AR) coatings; Deeply etched waveguide terminator; Finite difference time domain (FDTD) method; Perfectly matched layer (PML)

Indexed keywords

ANTIREFLECTION COATINGS; BOUNDARY CONDITIONS; FINITE DIFFERENCE METHOD; MATRIX ALGEBRA; POWER AMPLIFIERS; TIME DOMAIN ANALYSIS;

WAVEGUIDE TERMINATORS;

OPTICAL WAVEGUIDES;

EID: 0037322073     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2002.807185     Document Type: Article

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