Characteristics of Zn1-xMnxO thin films prepared by RF magnetron sputtering

Journal of the Korean Physical Society

Volumn 42, Issue SPEC., 2003, Pages

  Kim, Doo Soo ^a   Kim, Hwa Mok ^a   Yuldashev, Shavkat U ^a   Lee, Se Joon ^a   Kang, Tae Won ^a   Kim, Deuk Young ^a  

^a Dongguk University   (South Korea)

Author keywords

Diluted magnetic semiconductor; RF magnetron sputtering; Thin film; Zn1 xMnxO

Indexed keywords

EID: 0037305270     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (9)

1. Y. H. Chang and C. H. Park, J. Korean Phys. Soc. 39, 324 (2001).
2. Youngho Um, S. Lee, X. Liu and J. K. Furdyna, J. Korean Phys. Soc. 39, 429 (2001).
3. Nammee Kim, S. J. Lee, T. W. Kang, K. S. Yi and G. Ihm, J. Korean Phys. Soc. 39, 1050 (2001).
4. J. K. Furdyna, J. Appl. Phys. 64, R29 (1988).
5. H. Ohno, H. Munekata, T. Penney, S. von Molnar and L.L. Chang, Phys. Rew. Lett. 68, 2664 (1992).
6. T. Dietl, H. Ohno, F. Matsukura. J. Cibert and D. Ferrand, Science 287, 1019 (2000).
7. T. Furukawa, Z. Jin, A. Ohtomo. H. Koinuma and M. Kawasaki, Appl. Phys. Lett. 75, 3366 (2000).
8. K. Ueda. H. Tabata and T. Kawai, Appl. Phys. Lett. 79, 988 (2001).
9. S. W. Sung, S. -J. An, G. C. Yi, C. U. Jung, S. -I, Lee and S. Cho, Appl. Phys. Lett. 80, 4561 (2002).