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Volumn 34, Issue 2, 2003, Pages 127-131

Generation lifetime improvement on MOS capacitor by fast neutron enhanced intrinsic gettering technique

Author keywords

Czochralski Si; Fast neutron irradiation; Intrinsic gettering; Minority carrier generation lifetime; MOS capacitors

Indexed keywords

ANNEALING; CHARGE CARRIERS; NEUTRON IRRADIATION; SILICON WAFERS;

EID: 0037304119     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(02)00152-0     Document Type: Article
Times cited : (3)

References (7)
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  • 2
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  • 3
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    • Lifetime improvement in Czochrdski-grown silicon wafer by the use of a two-step annealing
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    • Yamamoto, K.1    Kishino, S.2    Matsushita, Y.3    Lizuka, T.4
  • 4
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    • Development of a bulk microdefect analyzer for Si wafer
    • Moriya K., Hirai K., Kashima K. Development of a bulk microdefect analyzer for Si wafer. J. Appl. Phys. 66:1989;5267-5273.
    • (1989) J. Appl. Phys. , vol.66 , pp. 5267-5273
    • Moriya, K.1    Hirai, K.2    Kashima, K.3
  • 5
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    • Heavy metal gettering by an intrinsic gettering technique using microdefects in Czochralski-grown silicon wafer
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    • Kishino, S.1    Nagasawa, K.2    Takashi, I.3
  • 6
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    • Fast neutron irradiation for Czochrdski grown silicon
    • Xu Y., Li Y., Liu C., Wang H. Fast neutron irradiation for Czochrdski grown silicon. Appl. Phys. Lett. 65:1994;2807-2808.
    • (1994) Appl. Phys. Lett. , vol.65 , pp. 2807-2808
    • Xu, Y.1    Li, Y.2    Liu, C.3    Wang, H.4
  • 7
    • 0034273164 scopus 로고    scopus 로고
    • Minority-carrier lifetime optimization in silicon MOS devices
    • Choe K.S., Jang B.N. Minority-carrier lifetime optimization in silicon MOS devices. J. Cryst. Growth. 218:2000;239-244.
    • (2000) J. Cryst. Growth , vol.218 , pp. 239-244
    • Choe, K.S.1    Jang, B.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.