An ellipsometric analysis of CVD-diamond films at infrared wavelengths

Carbon

Volumn 41, Issue 5, 2003, Pages 967-972

  Fang, Zhijun ^a   Xia, Yiben ^a   Wang, Linjun ^a   Zhang, Weili ^a   Ma, Zheguo ^a   Zhang, Minglong ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

A. Diamond; B. Chemical vapor deposition; C. Ellipsometry; D. Optical properties

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; INFRARED RADIATION; INTERFACES (MATERIALS); OPTICAL PROPERTIES; SILICON; SUBSTRATES; SURFACE ROUGHNESS; VOLUME FRACTION;

INFRARED WAVELENGTHS;

DIAMOND FILMS;

EID: 0037261517     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(02)00419-0     Document Type: Article

References (8)

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