The role of defects on the electrochromic response time of sputter-deposited Ni oxide films

Solid State Ionics

Volumn 156, Issue 3-4, 2003, Pages 433-437

  Ahn, Kwang Soon ^a   Nah, Yoon Chae ^a   Sung, Yung Eun ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Electrochromics; Ni oxide; Response time; Sputtering; Transmittance

Indexed keywords

AMORPHOUS FILMS; CRYSTALLOGRAPHY; DEFECTS; PROTONS; SPUTTER DEPOSITION;

ELECTROCHROMIC RESPONSE TIME;

ELECTROCHROMISM;

EID: 0037213771     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-2738(02)00696-3     Document Type: Article

References (14)

1. Granqvist C.G. Handbook of Inorganic Electrochromic Materials. 1995;Elsevier, Amsterdam.
2. Gellings P.J., Bouwmeester H.J.M. The CRC Handbook of Solid State Electrochemistry. 1997;CRC Press, Boca Raton. Chap. 16.
3. Jeong D.J., Kim W.S., Sung Y.-E. Jpn. J. Appl. Phys. 40:2001;L708.
4. Jeong D.J., Kim W.S., Choi Y.K., Sung Y.-E. J. Electroanal. Chem. 511:2001;79.
5. Lee S.H., Cheong H.M., Tracy C.E., Mascarenhas A., Pitts J.R., Jorgensen G., Deb S.K. Appl. Phys. Lett. 76:2000;3908.
6. Kaneko H., Miyake K. J. Appl. Phys. 66:1989;845.
7. Chen L.C., Ho K.C. Electrochim. Acta. 46:2001;2151.
8. Granqvist C.G. Appl. Phys., A. 57:1993;3.
9. Ahn K.S., Nah Y.C., Yum J.H., Sung Y.-E. Jpn. J. Appl. Phys. 41:2002;L212.
10. Jiang S.R., Feng B.X., Yan P.X., Cai X.M., Lu S.Y. Appl. Surf. Sci. 174:2001;125.
11. Conell R.S., Corrigan D.A., Powell B.R. Sol. Energy Mater. 25:1992;301.
12. Wu Y., Wu G., Ni X., Wu X. Fourth International Conference on Thin Films Physics and Applications. Proceedings of SPIE. vol. 4086:2000;418.
13. Brundle C.R., Evans C.A. Jr., Wilson S. Encyclopedia of Materials Characterization. 1992;476-487 Butterworth-Heinemann, Stoneham.
14. Gorenstein A., Dechker F., Estrada W., Esteves C., Andersson A., Passerini S., Pantaloni S., Scrosati B. J. Electroanal. Chem. 277:1990;277.