A numerical investigation of the effects of gas-phase particle formation on silicon film deposition from silane

Journal of Crystal Growth

Volumn 247, Issue 3-4, 2003, Pages 333-356

  Kremer, D M ^a   Davis, R W ^b   Moore, E F ^b   Ehrman, S H ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

A1. Computer simulation; A1. Fluid flows; A1. Nucleation; A3. Chemical vapor deposition processes; B2. Semiconducting silicon

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ROTATING DISKS; SCAVENGING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILANES;

FILM DEPOSITION;

PARTICLES (PARTICULATE MATTER);

EID: 0037212457     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)02060-2     Document Type: Article

References (42)

1. Jasinski J.M., Meyerson B.S., Scott B.A. Ann. Rev. Phys. Chem. 38:1987;109.
2. Bloem J. J. Crystal Growth. 50:1980;581.
3. Ryan K.R., Plumb I.C. CRC Crit. Rev. Solid State Mater. Sci. 15:1988;153.
4. D.M. Kremer, R.W. Davis, E.F. Moore, J.E. Maslar, D.R. Burgess, S.H. Ehrman, J. Electrochem. Soc., to appear.
5. Lewis C.H., Kelly H.C., Giusto M.B., Johnson S. J. Electrochem. Soc. 108:1961;1114.
6. Beers A.M., Bloem J. Appl. Phys. Lett. 41:1982;153.
7. Bhola S.R., Mayer A. RCA Rev. 24:1963;511.
8. Richman D., Arlett R.H. J. Electrochem. Soc. 116:1969;872.
9. Richman D., Chiang Y.S., Robinson P.H. RCA Review. 31:1970;613.
10. Joyce B.A., Bradley R.R. J. Electrochem. Soc. 110:1963;1235.
11. Eversteijn F.C. Philips Res. Rep. 26:1971;134.
12. Breiland W.G., Evans G.H. J. Electrochem. Soc. 138:1989;1806.
13. Fotiadis D.I., Kremer A.M., McKenna D.R., Jensen K.F. J. Crystal Growth. 85:1987;154.
14. Evans G.H., Greif R. J. Heat Transfer. 109:1987;928.
15. Jensen K.F., Einset E.O., Fotiadis D.I. Ann. Rev. Fluid Mech. 23:1991;197.
16. Moffat H., Jensen K.F. J. Crystal Growth. 77:1986;108.
17. Coltrin M.E., Kee R.J., Miller J.A. J. Electrochem. Soc. 133:1986;1207.
18. Coltrin M.E., Kee R.J., Evans G.H. J. Electrochem. Soc. 136:1989;819.
19. Girshick S.L., Swihart M.T., Suh S.M., Mahajan M.R., Nijhawan S. J. Electrochem. Soc. 147:2000;2303.
20. E.R. Whitby, P.H. McMurry, U. Shankar, F.S. Binkowski, Report No. 68-01-7365, US Environmental Protection Agency, Research Triangle Park, NC, 1991.
21. Vorob'ev A.N., Egorov Yu.E., Makarov Yu.N., Zhmakin A.I., Galyukov A.O., Rupp R. Mater. Sci. Eng. B. 61-62:1999;172.
22. M.E. Coltrin, R.J. Kee, G.H. Evans, E. Meeks, F.M. Rupley, J.F. Grcar, Report No. SAND91-8003, Sandia National Laboratories, Albuquerque, NM, 1991.
23. R.J. Kee, F.M. Rupley, J.A. Miller, Report No. SAND89-8009, Sandia National Laboratory, Albuquerque, NM, 1989.
24. M.E. Coltrin, R.J. Kee, F.M. Rupley, Report No. SAND90-8003B, Sandia National Laboratory, Albuquerque, NM, 1991.
25. R.J. Kee, G. Dixon-Lewis, J. Warnatz, M.E. Coltrin, J.A. Miller, Report No. SAND86-8246, Sandia National Laboratory, Albuquerque, NM, 1986.
26. Ho P., Coltrin M.E., Breiland W.G. J. Phys. Chem. 98:1994;10138.
27. Coltrin M.E., Kee R.J., Miller J.A. J. Electrochem. Soc. 131:1984;425.
28. Mick H.J., Roth P., Smirnov V.N., Zasionko I.S. Kinet. Katal. 35:1994;439.
29. Mick H.J., Markus M.W., Roth P., Smirnov V.N. Ber. Bunsenges. Phys. Chem. 99:1995;880.
30. Martin D.L., Raff L.M., Thompson D.L. J. Chem. Phys. 92:1990;425.
31. Houf W.G., Grcar J.F., Breiland W.G. Mater. Sci. Eng. B. 17:1993;163.
32. Ramalingam S., Aydil E.S., Maroudas D. J. Vac. Sci. Technol. B. 19:2001;634.
33. S.K. Friedlander, Smoke, Dust and Haze, Wiley, New York, 2000, p. 14.
34. Zachariah M.R., Semerjian H.G. A.I.Ch.E. J. 35:1989;2003.
35. Dobbins R.A., Mulholland G.W. Combust. Sci. Technol. 40:1984;175.
36. A. Radhakrishnan, A.C. Hindmarsh, Report No. UCRL-ID-113855, Lawrence Livermore National Laboratory, Livermore, CA, 1993.
37. Slootman F., Parent J.C. J. Aerosol Sci. 25:1994;15.
38. Handbook of Compressed Gases, Van Nostrand Reinhold, New York, 1989, p. 395.
39. Y. Sato, T. Ohmine, Extended Abstracts of the 1991 International Conference on Solid State Devices and Materials, Yokohama, Japan, 1991.
40. Pollard R., Newman J. J. Electrochem. Soc. 127:1980;744.
41. Biber C.R., Wang C.A., Motaker S. J. Crystal Growth. 123:1992;545.
42. W.G. Breiland, Private communication.