Mean free paths for inelastic electron scattering in silicon and poly(styrene) nanospheres

Ultramicroscopy

Volumn 94, Issue 1, 2003, Pages 31-35

  Chou, T M ^a   Libera, M ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

EELS; Electron energy loss spectroscopy; Electron holography; Inelastic scattering; Mean free path; Transmission electron microscope

Indexed keywords

ELECTRON ENERGY LEVELS; ELECTRON HOLOGRAPHY; NANOSTRUCTURED MATERIALS; POLYSTYRENES; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

FREE PATHS;

ELECTRON SCATTERING;

NANOPARTICLE; POLYSTYRENE; SILICON;

ARTICLE; ELECTRON; ELECTRON ENERGY LOSS SPECTROSCOPY; FIELD EMISSION; HOLOGRAPHY; IMAGING; QUANTITATIVE ANALYSIS; REFRACTION INDEX; SIGNAL NOISE RATIO; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0037212159     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00192-4     Document Type: Article

References (10)

1. Malis T., Cheng S.C., Egerton R.F. J. Electron Microsc. Tech. 8:1988;193-200.
2. Gajdardziska-Josifovska M., McCartney M.R. Ultramicroscopy. 53:1994;291-296.
3. McCartney M.R., Gajdardziska-Josifovska M. Ultramicroscopy. 53:1994;283-289.
4. Gajdardziska-Josifovska M., McCartney M.R., Ruijter W.J.D., Smith D.J., Weiss J.K., Zuo J.M. Ultramicroscopy. 50:1993;285.
5. Wang Y.C., Chou T.M., Libera M., Voelkl E., Frost B.G. Microsc. Microanal. 4:1998;146-157.
6. Wang Y.C., Chou T.M., Libera M., Kelly T.F. Appl. Phys. Lett. 70:1997;1296-1298.
7. M. Libera, J. Ott, Y.C. Wang, in: A. Tonomura et al. (Eds.), Electron Holography, North-Holland, New York, 1995, pp. 231-238.
8. H. Lichte (Ed.), Advances in Optical and Electron Microscopy, Vol. 12, Academic Press, New York, 1991, pp. 25-91.
9. Plitzko J.M., Mayer J. Ultramicroscopy. 78:1999;207-219.
10. McKenzie D.R., Green D.C., Swift P.D., Cockayne D.J.H., Martin P.J., Netterfield R.P., Sainty W.G. Thin Solid Films. 193:1990;418-430.