Formation of channel waveguide with grating in polymer films based on simultaneous photobleaching and embossing

Optical Materials

Volumn 21, Issue 1-3, 2003, Pages 495-498

  Shibata, S ^a   Sugihara, O ^a   Che, Y ^a   Fujimura, H ^a   Egami, C ^a   Okamoto, N ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Channel waveguide; Grating; Mask master; Nonlinear optical polymer; Replica

Indexed keywords

DIFFRACTION GRATINGS; MASKS; NONLINEAR OPTICS; OPTICAL WAVEGUIDES; THIN FILMS;

CHANNEL WAVEGUIDES;

PLASTIC FILMS;

EID: 0037210939     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(02)00189-1     Document Type: Conference Paper

References (6)

1. Singer K.D., Sohn J.E., Lalama S.J. Appl. Phys. Lett. 49:1986;248.
2. Singer K.D., Kuzyk M.G., Holland W.R., Sohn J.E., Lalama S.J., Comizzoli R.B., Katz H.E., Schilling M.L. Appl. Phys. Lett. 53:1988;1800.
3. Khanarian G., Norwood R.A., Haas D., Feuer B., Karim D. Appl. Phys. Lett. 57:1990;977.
4. Sugihara O., Nakanishi M., Fujimura H., Egami C., Okamoto N. Opt. Lett. 25:2000;1028.
5. Sugihara O., Nakanishi M., Che Y., Egami C., Kawata Y., Okamoto N. Appl. Opt. 39:2000;5632.
6. Shuto Y., Watanabe T., Tomaru S., Yokohama I., Hikita M., Amano M. IEEE J. Quantum Electron. 33:1997;349.