Lattice damage induced by Tb-implanted AlN crystalline films

Applied Surface Science

Volumn 205, Issue 1-4, 2002, Pages 262-266

  Lu, Fei ^a,b   Hu, Hui ^a   Rizzi, A ^b  

^a SHANDONG UNIVERSITY   (China)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

AlN crystalline film; Implantation; Lattice damage; Terbium

Indexed keywords

ALUMINUM NITRIDE; ANNEALING; CRYSTAL LATTICES; ION IMPLANTATION; SEMICONDUCTOR DOPING; TERBIUM;

CRYSTALLINE FILMS;

SEMICONDUCTING FILMS;

EID: 0037204361     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01087-5     Document Type: Article

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