Focused ion beam machining of silicon

Journal of Materials Processing Technology

Volumn 127, Issue 2, 2002, Pages 256-260

  Hung, N P ^a   Fu, Y Q ^a   Ali, M Y ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Focused ion beam; Micromachining; Single crystal silicon

Indexed keywords

ION BEAMS; SILICON; SINGLE CRYSTALS; SPUTTERING; SURFACE ROUGHNESS;

ION BEAM MACHINING;

MACHINING;

EID: 0037200999     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(02)00153-X     Document Type: Conference Paper

References (3)

1. Recent advances in application of focused ion beam technology
2. Focused ion beam sample preparation of non-semiconductor materials
3. Micro-machining using a focused ion beam