Photoetching effects in mercuric iodide

Applied Surface Science

Volumn 165, Issue 2, 2000, Pages 233-240

  Ponpon, J P ^a   Montgomery, P C ^a   Sieskind, M ^a   Amann, M ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ETCHING; LIGHT ABSORPTION; PHOTOCHEMICAL REACTIONS; PHOTOSENSITIVITY; SURFACE ROUGHNESS;

MERCURIC IODIDE; PHOTOETCHING;

MERCURY COMPOUNDS;

EID: 0034273923     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00511-0     Document Type: Article

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