|
|
Volumn 409, Issue 2, 2002, Pages 220-226
|
|
Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength
a
|
|
Author keywords
Aluminium oxide; Chromium oxide; Optical properties; Physical vapor deposition
|
|
Indexed keywords
ABSORPTION;
ADHESION;
ALUMINA;
CHARACTERIZATION;
CHROMIUM COMPOUNDS;
FABRICATION;
FUSED SILICA;
MAGNETRON SPUTTERING;
MASKS;
PHASE SHIFT;
PHYSICAL VAPOR DEPOSITION;
REFLECTION;
SILICON WAFERS;
TARGETS;
THIN FILMS;
ATTENUATED PHASE-SHIFTING MASKS (APSM);
OPTICAL CONSTANTS;
SUPERLATTICES;
|
|
EID: 0037197337
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(02)00137-2 Document Type: Article |
|
Times cited : (11)
|
|
References (17)
|
