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Volumn 409, Issue 2, 2002, Pages 220-226

Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength

Author keywords

Aluminium oxide; Chromium oxide; Optical properties; Physical vapor deposition

Indexed keywords

ABSORPTION; ADHESION; ALUMINA; CHARACTERIZATION; CHROMIUM COMPOUNDS; FABRICATION; FUSED SILICA; MAGNETRON SPUTTERING; MASKS; PHASE SHIFT; PHYSICAL VAPOR DEPOSITION; REFLECTION; SILICON WAFERS; TARGETS; THIN FILMS;

EID: 0037197337     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00137-2     Document Type: Article
Times cited : (11)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.