Ion beam assisted deposition - A processing technique for preparing thin films for high-technology applications

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 3-10

  Rauschenbach, Bernd ^a,b  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Giant magnetoresistive sensor; Ion beam assisted deposition; Ion beam deposition equipment; Ion sources; Mo Si multilayers; Solar absorber

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; GIANT MAGNETORESISTANCE; ION BEAM ASSISTED DEPOSITION; ION SOURCES; LITHOGRAPHY;

GIANT MAGNETORESISTIVE SENSORS;

THIN FILMS;

EID: 0037168477     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00302-0     Document Type: Conference Paper

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