Density functional study on the adsorption and surface reactions on SiO2 in TiN-CVD using TiCl4 and NH3

Thin Solid Films

Volumn 409, Issue 1, 2002, Pages 51-57

  Tanaka, Tatsuo ^a   Nakajima, Tohru ^a   Yamashita, Koichi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Amorphous; Density functional study; SiO2; TiN CVD

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; AMMONIA; CHEMICAL VAPOR DEPOSITION; PROBABILITY DENSITY FUNCTION; SILICA; SURFACE REACTIONS; TITANIUM COMPOUNDS;

MATERIAL GASES;

THIN FILMS;

EID: 0037156018     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00103-7     Document Type: Conference Paper

References (30)