Fabrication of directly UV-written channel waveguides with simultaneously defined integral Bragg gratings

Electronics Letters

Volumn 38, Issue 24, 2002, Pages 1531-1532

  Emmerson, G D ^a   Watts, S P ^a   Gawith, C B E ^a   Albanis, V ^a   Ibsen, M ^a   Williams, R B ^a   Smith, P G R ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FIBER BRAGG GRATINGS; HYDROLYSIS; PHOTOSENSITIVITY; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR DOPING; SILICA; ULTRAVIOLET RADIATION;

FLAME HYDROLYSIS DEPOSITION; GERMANIUM DOPED SILICA ON SILICON; INTERNAL BRAGG GRATINGS; PHOTOSENSITIVE SILICA ON SILICON; ULTRAVIOLET WRITTEN CHANNEL WAVEGUIDES;

WAVEGUIDES;

EID: 0037153545     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20021056     Document Type: Article

References (4)

1. HILL, K.O., and MELTZ, G.: 'Fiber Bragg grating technology fundamentals and overview', J. Lightwave. Technol., 1997, 15, pp. 1263-1276
2. SVALGAARD, M., and KRISTENSEN, M.: 'Directly UV written silica-on-silicon planar waveguides with low loss', Electron. Lett., 1997, 33, (10), pp. 861-863
3. FAERCH, K., and SVALGAARD, M.: 'Symmetrical waveguide devices fabricated by direct UV writing', IEEE Photonics Technol. Lett., 2002, 14, (2), pp. 173-175
4. UK Patent Application: GB2316760A