Characterization of epitaxial thin films of Bi2VO5.5 on La-doped SrTiO3 substrates prepared by coating-pyrolysis process

Thin Solid Films

Volumn 422, Issue 1-2, 2002, Pages 73-79

  Tsukada, Kenichi ^a,b   Nagahama, Tsutomu ^c   Sohma, Mitsugu ^a   Yamaguchi, Iwao ^a   Manabe, Takaaki ^a   Tsuchiya, Tetsuo ^a   Suzuki, Shigeru ^b   Shimizu, Tadao ^b   Mizuta, Susumu ^a,b   Kumagai, Toshiya ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Bi2VO5.5; Epitaxial thin films; La doped SrTiO3

Indexed keywords

ANISOTROPY; ANNEALING; ATOMIC FORCE MICROSCOPY; BISMUTH COMPOUNDS; DOPING (ADDITIVES); EPITAXIAL GROWTH; PYROLYSIS; STRONTIUM COMPOUNDS;

EPITAXIAL THIN FILMS;

THIN FILMS;

EID: 0037147229     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00984-7     Document Type: Article

References (16)

1. Paz de Araujo C.A., Cuchiaro J.D., McMillan L.D., Scott M.C., Scott J.F. Nature. 374:1995;627.
2. Prasad K.V.R., Varma K.B.R. Mater. Chem. Phys. 38:1994;406.
3. K. Tsukada, T. Nagahama, M. Sohma, I. Yamaguchi, T. Manabe, T. Tsuchiya, S. Suzuki, T. Shimizu, S. Mizuta, T. Kumagai, Thin Solid Films, submitted for publication.
4. Nagahama T., Manabe T., Yamaguchi I., Kumagai T., Mizuta S., Tsuchiya T. J. Mater. Res. 15:2000;783.
5. Sakai T., Watanabe T., Cho Y., Matsuura K., Funakubo H. Jpn. J. Appl. Phys. 40:2001;6481.
6. Newnham R.E., Wolfe R.W., Dorrian J.F. Mater. Res. Bull. 6:1971;1029.
7. Powder Diffraction File, Card 42-0135, Joint Committee on Powder Diffraction Standards, ASTM, Philadelphia, PA, 1998.
8. Varma K.B.R., Subbanna G.N., Guru Row T.N., Rao C.N.R. J. Mater. Res. 5:1990;2718.
9. Satyalakshmi K.M., Varma K.B.R., Hegde M.S. J. Appl. Phys. 78:1995;1160.
10. Nagahama T., Manabe T., Yamaguchi I., Kumagai T., Tsuchiya T., Mizuta S. Thin Solid Films. 353:1999;52.
11. Nagahama T., Manabe T., Yamaguchi I., Kumagai T., Tsuchiya T., Mizuta S. Mizutani N., Shinozaki K., Kamehara N., Kimura T. Electroceramics in Japan II, CSJ Series: Publications of the Ceramic Society of Japan, vol. 2. 1999;Trans Tech, Aedermannsdorf, Switzerland. p. 139.
12. Suzuki T., Nishi Y., Fujimoto M., Ishikawa K., Funakubo H. Jpn. J. Appl. Phys. 38:1999;L1265.
13. Blinovskov Y., Fotiev A.A. Russ. J. Inorg. Chem. 32:1987;145.
14. Prasad K.V.R., Varma K.B.R., Raju A.R., Satyalakshmi K.M., Mallya R.M., Hegde M.S. Appl. Phys. Lett. 63:1993;1898.
15. Joseph M., Lee H.Y., Tabata H., Kawai T. J. Appl. Phys. 88:2000;1193.
16. Tani K., Yamanobe T., Matsuhashi H., Nishikawa S. Jpn. J. Appl. Phys. 36:1997;1460.