ICP etching and structure study of PECVD SiC films

International Journal of Modern Physics B

Volumn 16, Issue 28-29, 2002, Pages 4318-4322

  Shi, J ^a   Choi, W K ^a   Chor, E F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON TETRAFLUORIDE; FLUORIDE; SILICON CARBIDE; UNCLASSIFIED DRUG;

CHEMICAL BOND; CONFERENCE PAPER; CRYSTAL STRUCTURE; FILM; HYDROGENATION; INFRARED SPECTROSCOPY; POROSITY; TEMPERATURE; X RAY DIFFRACTION;

EID: 0037146209     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0217979202015340     Document Type: Conference Paper

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