Structure and phase composition of sputter deposits from a C60 target bombarded by argon and xenon ions

Vacuum

Volumn 68, Issue 3, 2002, Pages 251-256

  Dudkin, V A ^a   Pukha, V E ^a   Vus, A S ^a   Stetsenko, A N ^a   Savitsky, B A ^a   Vovk, O M ^b  

^a NATIONAL TECHNICAL UNIVERSITY   (Ukraine)

^b B VERKIN INSTITUTE FOR LOW TEMPERATURE PHYSICS AND ENGINEERING   (Ukraine)

Author keywords

Carbon; Fullerene; Ion beam; Sputtering; Thin films

Indexed keywords

ARGON; DEPOSITION; EVAPORATION; ION BOMBARDMENT; PHASE COMPOSITION; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; XENON;

SPUTTER DEPOSITS;

THIN FILMS;

EID: 0037145943     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00453-0     Document Type: Conference Paper

References (4)

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2. Prawer S., Nugent K.W., Biggs S., McCulloch D.G., Leong W.H., Hoffman A., Kallish R. Phys Rev. B52:1995;841-849.
3. Ohsawa Y, Sawabe A, Inuzuka T. Proceedings of the International Ion engineering Congress - ISIAT'83 & IPAT'83, vol. 2. 12-16 September, Kyoto, 1983. p. 983-6.
4. Hoffman A., Paterson P.J.K., Johnston S.T., Prawer S. Phys Rev. B53:1996;1573-1578.