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Journal of Applied Physics

Volumn 92, Issue 10, 2002, Pages 6349-6350

Comment on "ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87, 1540 (2000)]

(3) Zanatta, A R a Ribeiro, C T M b Alvarez, F b

a UNIVERSITY OF SÃO PAULO (Brazil)

b UNIVERSITY OF CAMPINAS (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; ALN FILMS; ALUMINUM NITRIDE THIN FILMS; CRYSTALLINE ALUMINUM; CRYSTALLINE QUALITY; CRYSTALLINE SILICONS; FREQUENCY SHIFT; HIGH STRESS; PHONON FREQUENCIES; PHONON VIBRATION MODE; TEMPERATURE RANGE;

CRYSTALLINE MATERIALS; PHONONS; PULSED LASER DEPOSITION;

ALUMINUM NITRIDE;

EID: 0037112982 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1515948 Document Type: Article

Times cited : (1)

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