Boron-incorporated amorphous carbon films deposited by pulsed laser deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 9 A/B, 2002, Pages

  Tian, Xuemin ^a   Rusop, Mohamad ^a   Hayashi, Yasuhiko ^b   Soga, Tetsuo ^a   Jimbo, Takashi ^a   Umeno, Masayoshi ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

Amorphous; Boron incorporated; Heterojunction; Photovoltaic

Indexed keywords

CURRENT DENSITY; DEPOSITION; ELECTRIC POTENTIAL; GRAPHITE; HETEROJUNCTIONS; LIGHTING; PULSED LASER DEPOSITION; SEMICONDUCTING BORON; SHORT CIRCUIT CURRENTS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0037107057     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l970     Document Type: Article

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